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ICP

Inductively coupled plasma (ICP) is a type of plasma source often coupled with common forms of atomic spectroscopy such as optical emission spectroscopy (OES), or atomic emission spectroscopy (AES) for the analysis of elemental composition. Spex® Certiprep Assurance Grade or our High Purity Standards ICP CRMs are designed for ICP analyses as both single-element and multi-element formulations from 1,000 μg/mL and/or 10,000 μg/mL in packaging from 30 mL to 500 mL. Our standards use of high-quality water, acids, and raw materials with direct traceability to NIST (where applicable) to meet our customer’s needs.
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Terbium at 10,000 µg/mL in 4% HNO3 Terbium at 10,000 µg/mL in 4% HNO3
SKU: 10M57-1

Terbium at 10,000 µg/mL in 4% HNO3

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  • Brand HPS
  • Matrix 4% HNO3
  • Concentration 10,000 µg/mL
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Tellurium at 10,000 µg/mL in 5% HNO3 + 2% HF Tellurium at 10,000 µg/mL in 5% HNO3 + 2% HF
SKU: 10M56-3

Tellurium at 10,000 µg/mL in 5% HNO3 + 2% HF

  • CCL
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  • Brand HPS
  • Matrix 5% HNO3 & 2% HF
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Tellurium at 10,000 µg/mL in 40% HCl Tellurium at 10,000 µg/mL in 40% HCl
SKU: 10M56-2

Tellurium at 10,000 µg/mL in 40% HCl

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  • Brand HPS
  • Matrix 40% HCl
  • Concentration 10,000 µg/mL
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Tantalum at 10,000 µg/mL in 5% HNO3 + 2% HF Tantalum at 10,000 µg/mL in 5% HNO3 + 2% HF
SKU: 10M55-3

Tantalum at 10,000 µg/mL in 5% HNO3 + 2% HF

  • CCL
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  • Brand HPS
  • Matrix 5% HNO3 & 2% HF
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Sulfur at 10,000 µg/mL in H2O Sulfur at 10,000 µg/mL in H2O
SKU: 10M54-5

Sulfur at 10,000 µg/mL in H2O

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  • Brand HPS
  • Matrix H2O
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Strontium at 10,000 µg/mL in 10% HCl Strontium at 10,000 µg/mL in 10% HCl
SKU: 10M53-2

Strontium at 10,000 µg/mL in 10% HCl

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  • Brand HPS
  • Matrix 10% HCl
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Strontium at 10,000 µg/mL in 1% HNO3 Strontium at 10,000 µg/mL in 1% HNO3
SKU: 10M53-1

Strontium at 10,000 µg/mL in 1% HNO3

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  • Brand HPS
  • Matrix 1% HNO3
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Sodium at 10,000 µg/mL in 1% HCl Sodium at 10,000 µg/mL in 1% HCl
SKU: 10M52-2

Sodium at 10,000 µg/mL in 1% HCl

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  • Brand HPS
  • Matrix 1% HCl
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Sodium at 10,000 µg/mL in 1% HNO3 Sodium at 10,000 µg/mL in 1% HNO3
SKU: 10M52-1

Sodium at 10,000 µg/mL in 1% HNO3

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  • Brand HPS
  • Matrix 1% HNO3
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Silver at 10,000 µg/mL in 4% HNO3 Silver at 10,000 µg/mL in 4% HNO3
SKU: 10M51-1

Silver at 10,000 µg/mL in 4% HNO3

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  • Brand HPS
  • Matrix 4% HNO3
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Silicon at 10,000 µg/mL in H2O from (NH4)2SiF6 Silicon at 10,000 µg/mL in H2O from (NH4)2SiF6
SKU: 10M50-4F

Silicon at 10,000 µg/mL in H2O from (NH4)2SiF6

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  • Brand HPS
  • Matrix H2O
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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Silicon at 10,000 µg/mL in H2O from Na2SiO3 Silicon at 10,000 µg/mL in H2O from Na2SiO3
SKU: 10M50-4

Silicon at 10,000 µg/mL in H2O from Na2SiO3

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  • Brand HPS
  • Matrix H2O
  • Concentration 10,000 µg/mL
  • Measured Impurities 67 elements to ppb (product)
  • Raw Material Five 9s as available; no purification
  • Certification Single: Gravimetric w/ICP Confirmation
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